The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
Sep. 17, 2003
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vital'evitch Ivanov, Moscow, RU;
Erik René Kieft, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Yurii Victorovitch Sidelkov, Troitsk, RU;
Vsevolod Grigorevitch Koloshnikov, Moscow, RU;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
Robert Rafilevitch Gayazov, Troitsk, RU;
Olav Waldemar Vladimir Frijns, Eindhoven, NL;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vital'Evitch Ivanov, Moscow, RU;
Erik René Kieft, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Yurii Victorovitch Sidelkov, Troitsk, RU;
Vsevolod Grigorevitch Koloshnikov, Moscow, RU;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
Robert Rafilevitch Gayazov, Troitsk, RU;
Olav Waldemar Vladimir Frijns, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile