The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Aug. 18, 2004
Tomohiro Okumura, Kadoma, JP;
Hideo Haraguchi, Toyonaka, JP;
Takuya Matsui, Matsubara, JP;
Izuru Matsuda, Kadoma, JP;
Akio Mitsuhashi, Yao, JP;
Tomohiro Okumura, Kadoma, JP;
Hideo Haraguchi, Toyonaka, JP;
Takuya Matsui, Matsubara, JP;
Izuru Matsuda, Kadoma, JP;
Akio Mitsuhashi, Yao, JP;
Matsushita Electric Industrial Co., Ltd., Osaka-fu, JP;
Abstract
The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.