The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Dec. 09, 2004
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Fishkill, NY (US);
Gerrit J. Leusink, Saltpoint, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Daisuke Kuroiwa, Clifton Park, NY (US);
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Fishkill, NY (US);
Gerrit J. Leusink, Saltpoint, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Daisuke Kuroiwa, Clifton Park, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A replaceable precursor tray for use with a high conductance, multi-tray solid precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of solid precursor. The multi-tray solid precursor evaporation system is configured to be coupled to the process chamber of a thin film deposition system, and it includes a base tray with one or more stackable upper trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.