The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2009

Filed:

Feb. 14, 2006
Applicants:

Russell J. Low, Rowley, MA (US);

George M. Gammel, Marblehead, MA (US);

Peter F. Kurunczi, Somerville, MA (US);

Eric Cobb, Danvers, MA (US);

Inventors:

Russell J. Low, Rowley, MA (US);

George M. Gammel, Marblehead, MA (US);

Peter F. Kurunczi, Somerville, MA (US);

Eric Cobb, Danvers, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A charge monitoring system may include a platen having a surface configured to accept a wafer thereon, and a charge monitor disposed relative to the platen so that an ion beam simultaneously strikes a portion of the charge monitor and a portion of the wafer. The charge monitor is configured to provide a charge monitor signal representative of a charge on a surface of the wafer when the ion beam simultaneously strikes the portion of the charge monitor and the portion of the wafer. The charge monitor signal may depend, at least in part, on a beam potential of the ion beam.


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