The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2008
Filed:
Jul. 11, 2006
Tri Thanh Khuong, San Jose, CA (US);
Junwei Bao, Palo Alto, CA (US);
Jeffrey A. Chard, Sunnyvale, CA (US);
Wei Liu, Santa Clara, CA (US);
Ying Zhu, Cupertino, CA (US);
Sachin Deshpande, San Jose, CA (US);
Pranav Sheth, San Jose, CA (US);
Hong Qiu, Union City, CA (US);
Tri Thanh Khuong, San Jose, CA (US);
Junwei Bao, Palo Alto, CA (US);
Jeffrey A. Chard, Sunnyvale, CA (US);
Wei Liu, Santa Clara, CA (US);
Ying Zhu, Cupertino, CA (US);
Sachin Deshpande, San Jose, CA (US);
Pranav Sheth, San Jose, CA (US);
Hong Qiu, Union City, CA (US);
Tokyo Electron Ltd., Tokyo, JP;
Abstract
A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.