The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2008

Filed:

Feb. 18, 2004
Applicants:

Chang-cheng Hung, Hsin-chu, TW;

Hung-chang Hsieh, Hsinchu, TW;

Hsen-lin Wu, Hsin-chu, TW;

Tyng-hao Hsu, Hsin-chu, TW;

Inventors:

Chang-Cheng Hung, Hsin-chu, TW;

Hung-Chang Hsieh, Hsinchu, TW;

Hsen-Lin Wu, Hsin-chu, TW;

Tyng-Hao Hsu, Hsin-chu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system is disclosed for inspecting defects on a wafer. After acquiring at least one digitized image of at least one portion of a wafer, at least one design database file corresponding to the portion of the wafer is converted into at least one inspection file. After setting one or more error detection thresholds, the digitized image and the inspection file are compared by an inspection tool for detecting defects with regard to the portion of the wafer based on the set error detection thresholds.


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