The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2008
Filed:
Jul. 12, 2006
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Everhardus Cornelis Mos, Best, NL;
Leonardus Henricus Marie Verstappen, Weert, NL;
Roy Werkman, Waalre, NL;
Henricus Jacobus Maria Verhoeven, Eindhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Everhardus Cornelis Mos, Best, NL;
Leonardus Henricus Marie Verstappen, Weert, NL;
Roy Werkman, Waalre, NL;
Henricus Jacobus Maria Verhoeven, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment data are obtained by performing an alignment measurement on a plurality of alignment marks on a number of substrates. For each grid model it is checked whether the alignment data is suitable to solve the grid model. If so, the grid model is added to a subset of grid models. The grid model with lowest residuals is selected. In addition to alignment data, metrology data may be obtained by performing an overlay measurement on a plurality of overlay marks on the number of substrates. For each grid model of the subset simulated metrology data may then be determined that is used to determine overlay performance indicators. The grid model is then selected using the overlay performance indicators.