The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Dec. 13, 2007
Ulrich Loering, Oberkochen, DE;
Vladan Blahnik, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Norbert Wabra, Werneck, DE;
Ulrich Loering, Oberkochen, DE;
Vladan Blahnik, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Norbert Wabra, Werneck, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.