The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Apr. 28, 2006
Atsuko Fukada, Kokubunji, JP;
Mitsugu Sato, Hitachinaka, JP;
Naomasa Suzuki, Hitachinaka, JP;
Hidetoshi Nishiyama, Higashiyamato, JP;
Muneyuki Fukuda, Kokubunji, JP;
Noritsugu Takahashi, Hitachinaka, JP;
Atsuko Fukada, Kokubunji, JP;
Mitsugu Sato, Hitachinaka, JP;
Naomasa Suzuki, Hitachinaka, JP;
Hidetoshi Nishiyama, Higashiyamato, JP;
Muneyuki Fukuda, Kokubunji, JP;
Noritsugu Takahashi, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.