The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Jan. 23, 2008
Hans-juergen Mann, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Joerg Schultz, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Karl-heinz Schuster, Koenigsbronn, DE;
Udo Dinger, Oberkochen, DE;
Martin Antoni, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Hans-Juergen Mann, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Joerg Schultz, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
Udo Dinger, Oberkochen, DE;
Martin Antoni, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.