The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Nov. 03, 2004
Jason Z. Lin, Saratoga, CA (US);
Hong Chen, San Ramon, CA (US);
Evgeni Shifrin, Sunnyvale, CA (US);
Ashok V. Kulkarni, San Jose, CA (US);
Santosh K. Bhattacharyya, San Jose, CA (US);
Wei Zhao, Sunnyvale, CA (US);
Chien-huei Chen, San Jose, CA (US);
Jason Z. Lin, Saratoga, CA (US);
Hong Chen, San Ramon, CA (US);
Evgeni Shifrin, Sunnyvale, CA (US);
Ashok V. Kulkarni, San Jose, CA (US);
Santosh K. Bhattacharyya, San Jose, CA (US);
Wei Zhao, Sunnyvale, CA (US);
Chien-Huei Chen, San Jose, CA (US);
KLA-Tencor Corporation, San Jose, CA (US);
Abstract
A method of detecting anomalies in a test image. Test features of pixels within the test image are selected, and reference features of pixels within at least one reference image are also selected. A signal distribution of test features and reference features in a multi-dimensional feature space is created, and stored. Those test features of the test image that do not satisfy a set of criteria for normalcy are selected as candidate points. Those candidate points that are statistical outliers are identified as anomalies. Positions of the anomalies are located using the stored signal distribution within which the defects have been identified as a lookup table.