The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2008

Filed:

Sep. 30, 2004
Applicants:

David Jentz, Hillsboro, OR (US);

Ramesh Viswanathan, Hillsboro, OR (US);

Paul Mcgregor, Hillsboro, OR (US);

Valery Dubin, Portland, OR (US);

Rajiv Rastogi, Portland, OR (US);

Inventors:

David Jentz, Hillsboro, OR (US);

Ramesh Viswanathan, Hillsboro, OR (US);

Paul McGregor, Hillsboro, OR (US);

Valery Dubin, Portland, OR (US);

Rajiv Rastogi, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 3/38 (2006.01); C25D 5/00 (2006.01); C25D 7/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A copper electroplating bath composition and a method of copper electroplating to improve gapfill are provided. The method of electroplating includes providing an aqueous electroplating composition, comprising copper, at least one acid, at least one halogen ion, an additive including an accelerating agent, a suppressing agent, and a suppressing-accelerating agent, and the solution and mixture products thereof; contacting a substrate with the plating composition; and impressing a multi-step waveform potential upon the substrate, wherein the multi-step waveform potential includes an entry step, wherein the entry step includes a first sub-step applying a first current and a second sub-step applying second current, the second current being greater than the first current. The accelerating agent is provided in concentration of greater than 1.5 ml/liter, the suppressing agent is provided in concentration of greater than 15 ml/liter, and the accelerating-suppressing agent is provided in concentration of greater than 10 ml/liter.


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