The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2008

Filed:

May. 05, 2006
Applicants:

Arno Jan Bleeker, Westerhoven, NL;

Vadim Yevgenyevich Banine, Helmond, NL;

Johannes Onvlee, s-Hertogenbosch, NL;

Jacques Cor Johan Van Der Donck, Alphen aan den Rijn, NL;

Michiel Peter Oderwald, Delft, NL;

Inventors:

Arno Jan Bleeker, Westerhoven, NL;

Vadim Yevgenyevich Banine, Helmond, NL;

Johannes Onvlee, s-Hertogenbosch, NL;

Jacques Cor Johan Van der Donck, Alphen aan den Rijn, NL;

Michiel Peter Oderwald, Delft, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method and device of inspecting contamination particles on an object comprising a patterned structure. The device includes a radiation system for directing a radiation beam to the object. The object is configured to scatter the beam. The device also includes an optical system arranged to receive scattered radiation from the object, and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector arranged to detect a fraction of radiation that is transmitted by the filter. Accordingly, contamination particles may be detected quickly and accurately.


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