The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Dec. 01, 2004
Anatoly Grayfer, Newton, MA (US);
Jürgen Michael Lobert, Franklin, MA (US);
William Goodwin, Medway, MA (US);
Frank Vincent Belanger, Webster, MA (US);
John E. Sergi, Franklin, MA (US);
Mark C. Phelps, Attleboro, MA (US);
Anatoly Grayfer, Newton, MA (US);
Jürgen Michael Lobert, Franklin, MA (US);
William Goodwin, Medway, MA (US);
Frank Vincent Belanger, Webster, MA (US);
John E. Sergi, Franklin, MA (US);
Mark C. Phelps, Attleboro, MA (US);
Entegris, Inc., Chaska, MN (US);
Abstract
The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.