The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2008
Filed:
Oct. 03, 2005
Benyamin Buller, Cupertino, CA (US);
William J. Devore, Hayward, CA (US);
Juergen Frosien, Riemerling, DE;
Xinrong Jiang, Palo Alto, CA (US);
Richard L. Lozes, Pleasanton, CA (US);
Henry Thomas Pearce-percy, Los Gatos, CA (US);
Dieter Winkler, Munich, DE;
Steven T. Coyle, Alameda, CA (US);
Helmut Banzhof, Poing, DE;
Benyamin Buller, Cupertino, CA (US);
William J. DeVore, Hayward, CA (US);
Juergen Frosien, Riemerling, DE;
Xinrong Jiang, Palo Alto, CA (US);
Richard L. Lozes, Pleasanton, CA (US);
Henry Thomas Pearce-Percy, Los Gatos, CA (US);
Dieter Winkler, Munich, DE;
Steven T. Coyle, Alameda, CA (US);
Helmut Banzhof, Poing, DE;
Jeol, Ltd., Tokyo, JP;
Abstract
An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.