The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2008
Filed:
Apr. 05, 2004
Helmut Haidner, Aalen, DE;
Wolfgang Emer, Aalen, DE;
Rainer Hoch, Aalen, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Martin Schriever, Aalen, DE;
Markus Goeppert, Aalen, DE;
Helmut Haidner, Aalen, DE;
Wolfgang Emer, Aalen, DE;
Rainer Hoch, Aalen, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Martin Schriever, Aalen, DE;
Markus Goeppert, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure () to be arranged on the object side, and/or a grating structure () to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.