The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Aug. 12, 2005
Mayuka Oosaki, Yokohama, JP;
Hiroki Kawada, Tsuchiura, JP;
Ryo Nakagaki, Kawasaki, JP;
Chie Shishido, Yokohama, JP;
Mayuka Oosaki, Yokohama, JP;
Hiroki Kawada, Tsuchiura, JP;
Ryo Nakagaki, Kawasaki, JP;
Chie Shishido, Yokohama, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A method for measuring a dimension of a pattern formed on a sample using a secondary electron image obtained by picking up an image of the sample using a scanning electron microscope includes: obtaining a secondary electron image of a sample by picking up an image of the sample using a scanning electron microscope; creating, using the secondary electron image, an image profile of a pattern whose dimension is to be measured, within the obtained secondary electron image; retrieving a model profile that matches best with the created image profile from a plurality of model profiles prestored that are obtained from respective secondary electron images of a plurality of patterns, the cross sections of the plurality of patterns being of known shapes and dimensions and being different in shape; and obtaining a dimension of the pattern using information of the retrieved model profile.