The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Dec. 16, 2004
Toralf Gruner, Aalen-Hofen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Damian Fiolka, Oberkochen, DE;
Wilhelm Ulrich, Aalen, DE;
Gerhard Fuerter, Ellwangen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Damian Fiolka, Oberkochen, DE;
Wilhelm Ulrich, Aalen, DE;
Gerhard Fuerter, Ellwangen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.