The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
May. 27, 2005
Wolfgang Emer, Aalen, DE;
Uwe Schellhorn, Aalen, DE;
Manfred Dahl, Lauchheim, DE;
Rainer Hoch, Aalen, DE;
Wolfgang Emer, Aalen, DE;
Uwe Schellhorn, Aalen, DE;
Manfred Dahl, Lauchheim, DE;
Rainer Hoch, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A method for determining at least one of distortion and de-focus for an optical imaging system. The method includes determining wavefront aberrations in a pupil plane of the optical imaging system by a wavefront measurement method, determining focus offset measured values in an xy-direction and/or z-direction for one or more different illumination settings by a test pattern measurement method with imaging and comparative evaluation of test patterns for the optical imaging system, and determining values for one or more aberration parameters that relate to the distortion and/or image surface from a prescribed relationship between the determined wavefront aberrations and the determined focus offset measured values. By prescribing a relationship between the wave aberrations and the focus offset measured values, it is possible for the results of the wavefront measurement method and of the test pattern measurement method to be linked to one another so as to enable an improved precision in the determination of distortion and/or image surface.