The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
May. 03, 2005
Chie Shishido, Yokohama, JP;
Ryo Nakagaki, Kawasaki, JP;
Mayuka Oosaki, Yokohama, JP;
Hiroki Kawada, Tsuchiura, JP;
Chie Shishido, Yokohama, JP;
Ryo Nakagaki, Kawasaki, JP;
Mayuka Oosaki, Yokohama, JP;
Hiroki Kawada, Tsuchiura, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention relates to an electron microscope which reduces a difference in measured values that occur due to a difference in resolution that cannot be fully adjusted which exists among electron microscopes, or occurs as time elapses, and a method for measuring dimensions. An operator adapted to compensate for changes of an electron image to be generated due to a difference in probe diameter is obtained in advance from electron images of one reference sample created by electron microscopes having different resolution (probe diameter). Then a compensation-measurement electron image which is equivalent to an electron image created under the same probe diameter by applying the operator for compensation, and the compensation-measurement electron image is used for measuring the dimensions.