The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
Mar. 18, 2005
George Liu, Hsinchu, TW;
Vencent Chang, Jhubei County, TW;
Norman Chen, Hsin-chu, TW;
Yao-ching Ku, Hsin Chu, TW;
Chin-hsiang Lin, Hsin-chu, TW;
Kuei Shun Chen, Hsin-chiu, TW;
George Liu, Hsinchu, TW;
Vencent Chang, Jhubei County, TW;
Norman Chen, Hsin-chu, TW;
Yao-Ching Ku, Hsin Chu, TW;
Chin-Hsiang Lin, Hsin-chu, TW;
Kuei Shun Chen, Hsin-chiu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A patterned hardmask and method for forming the same, the method including providing a substrate comprising an overlying resist sensitive to activating radiation; forming an overlying hardmask insensitive to the activating radiation; exposing the resist through the hardmask to the activating radiation; baking the resist and the hardmask; and, developing the hardmask and resist to form a patterned resist and patterned hardmask.