The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Mar. 18, 2005
Akihiko Sekine, Tokyo, JP;
Ikunao Isomura, Kawasaki, JP;
Toshiyuki Watanabe, Kawasaki, JP;
Shinji Sugihara, Kawasaki, JP;
Riki Ogawa, Kawasaki, JP;
Akihiko Sekine, Tokyo, JP;
Ikunao Isomura, Kawasaki, JP;
Toshiyuki Watanabe, Kawasaki, JP;
Shinji Sugihara, Kawasaki, JP;
Riki Ogawa, Kawasaki, JP;
Kabushiki Kaisha Topcon, Tokyo, JP;
Abstract
The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.