The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2008

Filed:

May. 20, 2002
Applicants:

Kurt K. Christenson, Minnetonka, MN (US);

Steven L. Nelson, Minnetonka, MN (US);

James R. Oikari, New Brighton, MN (US);

Jeff F. Olson, Burnsville, MN (US);

Biao Wu, Milpitas, CA (US);

Inventors:

Kurt K. Christenson, Minnetonka, MN (US);

Steven L. Nelson, Minnetonka, MN (US);

James R. Oikari, New Brighton, MN (US);

Jeff F. Olson, Burnsville, MN (US);

Biao Wu, Milpitas, CA (US);

Assignee:

FSI International, Inc., Chaska, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension reducing agent during at least partial drying; and the method may be performed using automated rinsing equipment; also described are automated rinsing apparatuses useful with the method.


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