The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Jan. 03, 2007
Hans-juergen Mann, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Joerg Schultz, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Karl-heinz Schuster, Koenigsbronn, DE;
Udo Dinger, Oberkochen, DE;
Martin Antoni, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Hans-Juergen Mann, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Joerg Schultz, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
Udo Dinger, Oberkochen, DE;
Martin Antoni, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.