The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2008
Filed:
Apr. 01, 2002
Diffraction condition simulation device, diffraction measurement system, and crystal analysis system
Applicants:
Ryouichi Yokoyama, Tokyo, JP;
Kamihisa Endo, Tokyo, JP;
Tetsuya Ozawa, Tokyo, JP;
Jimpei Harada, Tokyo, JP;
Inventors:
Ryouichi Yokoyama, Tokyo, JP;
Kamihisa Endo, Tokyo, JP;
Tetsuya Ozawa, Tokyo, JP;
Jimpei Harada, Tokyo, JP;
Assignee:
Rigaku Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06G 7/48 (2006.01); G01N 23/207 (2006.01);
U.S. Cl.
CPC ...
Abstract
A diffraction condition simulation device capable of calculating the UB matrix and the rotation matrix R and also their multiplication RUB, thereby obtaining and displaying any Bragg reflection conditions of any Bragg reflections desired by an operator of said device. The Bragg reflection conditions are useful for structure analysis and structure evaluation of any crystal samples.