The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
Jul. 19, 2004
Ken Murayama, Tsuchiura, JP;
Yukio Kenbou, Tokyo, JP;
Yuuichi Kunitomo, Tsuchiura, JP;
Takenori Hiroki, Tsuchiura, JP;
Yoshiyuki Nagano, Tsuchiura, JP;
Takafumi Morimoto, Kashiwa, JP;
Tooru Kurenuma, Tsuchiura, JP;
Hiroaki Yanagimoto, Ibaraki, JP;
Hiroshi Kuroda, Ibaraki, JP;
Shigeru Miwa, Ibaraki, JP;
Ken Murayama, Tsuchiura, JP;
Yukio Kenbou, Tokyo, JP;
Yuuichi Kunitomo, Tsuchiura, JP;
Takenori Hiroki, Tsuchiura, JP;
Yoshiyuki Nagano, Tsuchiura, JP;
Takafumi Morimoto, Kashiwa, JP;
Tooru Kurenuma, Tsuchiura, JP;
Hiroaki Yanagimoto, Ibaraki, JP;
Hiroshi Kuroda, Ibaraki, JP;
Shigeru Miwa, Ibaraki, JP;
Hitachi Kenki Finetech Co., Ltd., Tokyo, JP;
Abstract
A scanning probe microscope has a cantilever with a probe facing a sample and a measurement section for measuring a physical quantity occurring between the probe and the sample when the probe scans a surface of the sample, holding the physical quantity constant to measure the surface of the sample. The above microscope further has a probe tilt mechanism, an optical microscope etc. for detecting a position of the probe when the probe is tilted, and a control section for setting the probe in a first tilt posture and second tilt posture, measuring a surface of the sample by the measurement section at each tilt posture, detecting the position of the probe at least at the second tilt posture by the optical microscope etc., and making a measurement location at the second tilt posture match with a measurement location at the first tilt posture for measurement.