The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2008

Filed:

Jul. 14, 2005
Applicants:

Masahiro Watanabe, Yokohama, JP;

Takashi Hiroi, Yokohama, JP;

Maki Tanaka, Yokohama, JP;

Hiroyuki Shinada, Chofu, JP;

Yasutsugu Usami, Hitachinaka, JP;

Inventors:

Masahiro Watanabe, Yokohama, JP;

Takashi Hiroi, Yokohama, JP;

Maki Tanaka, Yokohama, JP;

Hiroyuki Shinada, Chofu, JP;

Yasutsugu Usami, Hitachinaka, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/86 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron beam apparatus including a table which mounts a specimen and is movable in three dimensional directions, an electron beam optical system irradiating an electron beam onto a specimen and for detecting a secondary electron emanated from the specimen by the irradiation of the electron beam, and a surface height detection system for detecting height of the surface of the specimen mounted on the table. A focus control system controls a relative position between a focus position of the electron optical system and the table in accordance with information of the height, and an image processing system obtains an image from the detected secondary electron and processes the obtained image to detect a defect on the surface of the specimen.


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