The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
May. 07, 2004
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Jan Rein Miedema, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Jan Rein Miedema, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.