The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2008
Filed:
Jun. 08, 2005
Kevin R. Verrier, Hampton, NH (US);
David K. Bernhardt, Hudson, MA (US);
Jerry F. Negrotti, Beverly, MA (US);
Donald N. Polner, Marblehead, MA (US);
Kevin R. Verrier, Hampton, NH (US);
David K. Bernhardt, Hudson, MA (US);
Jerry F. Negrotti, Beverly, MA (US);
Donald N. Polner, Marblehead, MA (US);
Axcelis Technologies, Inc., Beverly, MA (US);
Abstract
Method and apparatus for use in setting up workpiece treatment or processing equipment. A disclosed system processes silicon wafers that are treated during processing steps in producing semiconductor integrated circuits. The processing equipment includes a wafer support that supports a wafer in a treatment region during wafer processing. A housing provides a controlled environment within the housing interior for processing the wafer on the wafer support. A mechanical transfer system transports wafers to and from the support. A wafer simulator is used to simulate wafer movement and includes a pressure sensor for monitoring contact between the simulator and the wafer transfer and support equipment. In one illustrated embodiment the wafer simulator is generally circular and includes three equally spaced pressure sensors for monitoring contact with wafer transport and support equipment.