The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Aug. 12, 2005
Takanori Yagita, Ehime, JP;
Takashi Nishi, Ehime, JP;
Michiro Sugitani, Ehime, JP;
Junichi Murakami, Ehime, JP;
Mitsukuni Tsukihara, Ehime, JP;
Mitsuaki Kabasawa, Ehime, JP;
Masaki Ishikawa, Ehime, JP;
Tetsuya Kudo, Ehime, JP;
Takanori Yagita, Ehime, JP;
Takashi Nishi, Ehime, JP;
Michiro Sugitani, Ehime, JP;
Junichi Murakami, Ehime, JP;
Mitsukuni Tsukihara, Ehime, JP;
Mitsuaki Kabasawa, Ehime, JP;
Masaki Ishikawa, Ehime, JP;
Tetsuya Kudo, Ehime, JP;
Sen Corporation, An Shi and Axcelis Company, Tokyo, JP;
Abstract
In an irradiation system with an ion beam/charged particle beam having an energy filter, the energy filter is formed by deflection electrodes and a deflection magnet which can be switchingly used. The deflection magnet has a general window-frame shape and is formed with a hollow portion at its center. The deflection electrodes are installed, along with suppression electrodes, in a vacuum chamber arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other. Since the deflection electrodes and the deflection magnet can be switchingly used, the system can deal with a wider range of beam conditions and thus is widely usable.