The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2008

Filed:

Jan. 06, 2005
Applicants:

David L. Adler, San Jose, CA (US);

Mark A. Mccord, Los Gatos, CA (US);

Mehdi Vaez-iravani, Los Gatos, CA (US);

Liqun Han, Fremont, CA (US);

Kirk J. Bertsche, San Jose, CA (US);

Inventors:

David L. Adler, San Jose, CA (US);

Mark A. McCord, Los Gatos, CA (US);

Mehdi Vaez-Iravani, Los Gatos, CA (US);

Liqun Han, Fremont, CA (US);

Kirk J. Bertsche, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); G01R 31/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment disclosed relates to an electron beam apparatus for inspection of a semiconductor wafer, wherein substantially an entire area of the wafer surface is scanned without moving the stage. A cathode ray tube (CRT) gun may be used to rapidly (and cost effectively) scan the beam over the wafer. Another embodiment disclosed relates to a high-speed automated e-beam inspector configured to scan the e-beam in one dimension while translating the wafer in a perpendicular direction. The translation may be linear, or alternatively, may be in a spiral path. Other embodiments are also disclosed.


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