The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Jul. 07, 2003
Tatsuo Nishita, Tokyo-To, JP;
Tsukasa Yonekawa, Tokyo-To, JP;
Keisuke Suzuki, Tokyo-To, JP;
Toru Sato, Tokyo-To, JP;
Tatsuo Nishita, Tokyo-To, JP;
Tsukasa Yonekawa, Tokyo-To, JP;
Keisuke Suzuki, Tokyo-To, JP;
Toru Sato, Tokyo-To, JP;
Tokyo Electron Limited, Tokyo-to, JP;
Abstract
A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film. In a method for oxidation of a surface of an object to be processed in a single processing containerwhich can contain a plurality of objects to be processed, at least a nitride film is exposed on said surface, and said oxidation is performed by mainly using active hydroxyl/oxygen species in a vacuum atmosphere, setting a processing pressure to 133 Pa or below, and setting a processing temperature to 400° C. or above. Under these conditions, high interplanar uniformity is maintained and oxide films with favorable film quality are obtained by oxidizing nitride films on the surfaces of a plurality of objects to be processed.