The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2007

Filed:

Oct. 04, 2002
Applicants:

Dieter Winkler, Heimstetten, DE;

Pavel Adamec, Heimstetten, DE;

Achim Göhl, Heimstetten, DE;

Helmut Banzhof, Heimstetten, DE;

Inventors:

Dieter Winkler, Heimstetten, DE;

Pavel Adamec, Heimstetten, DE;

Achim Göhl, Heimstetten, DE;

Helmut Banzhof, Heimstetten, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/21 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides electron multiple beam devices () for probing or structuring a non-transparent specimen () with primary electron beams () with an array of electron beam sources () to generate multiple primary electron beams (), an electron sensor () with electron sensor segments () to detect electrons of the primary electron beams () and at least one anode () to direct the primary electron beams () towards the electron sensor (). The electron sensor () serves to inspect the primary electron beams (), calibrate the positions of the primary electron beams () and possibly adjust final focus length () and currents of the primary electron beams before or after a probing or structuring the upper surface () of a non-transparent specimens (). Further, methods to inspect primary electron beams (), to adjust final focus lengths () and to calibrate the multiple electron beam device () are provided.


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