The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2007
Filed:
Jul. 28, 2003
Stuart D. Hellring, Pittsburgh, PA (US);
Colin P. Mccann, Pittsburgh, PA (US);
Suryadevara V. Babu, Pottsdam, NY (US);
Yuzhuo LI, Norwood, NY (US);
Satish Narayanan, Hillsboro, OR (US);
Robert L. Auger, Pittsburgh, PA (US);
Stuart D. Hellring, Pittsburgh, PA (US);
Colin P. McCann, Pittsburgh, PA (US);
Suryadevara V. Babu, Pottsdam, NY (US);
Yuzhuo Li, Norwood, NY (US);
Satish Narayanan, Hillsboro, OR (US);
Robert L. Auger, Pittsburgh, PA (US);
PPG Industries Ohio, Inc., Cleveland, OH (US);
Abstract
This invention relates to a silica, a slurry composition, and a method of their preparation. In particular, the silica of the present invention includes aggregated primary particles. The slurry composition which incorporates the silica, is suitable for polishing articles and especially useful for chemical-mechanical planarization of semiconductor substrates and other microelectronic substrates.