The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Apr. 07, 2004
William N. Partlo, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Raymond F. Cybulski, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Raymond F. Cybulski, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the use of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.