The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2007
Filed:
May. 14, 2004
Hoite Pieter Theodoor Tolsma, Eindhoven, NL;
Ramon Navarro Y Koren, Veldhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Remi Daniel Marie Edart, Veldhoven, NL;
Pui Leng Lam, Veldhoven, NL;
Bernardus Johannes Antonius Hulshof, Veldhoven, NL;
Roland Adrianus Emanuel Maria Bogers, Mierlo, NL;
Hoite Pieter Theodoor Tolsma, Eindhoven, NL;
Ramon Navarro Y Koren, Veldhoven, NL;
Hubertus Johannes Gertrudus Simons, Venlo, NL;
Remi Daniel Marie Edart, Veldhoven, NL;
Pui Leng Lam, Veldhoven, NL;
Bernardus Johannes Antonius Hulshof, Veldhoven, NL;
Roland Adrianus Emanuel Maria Bogers, Mierlo, NL;
ASML Netherlands B.V., , NL;
Abstract
An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.