The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Nov. 24, 2004
Erik Roelof Loopstra, Heeze, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.