The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Oct. 26, 2006
Aleksandr Khmelichek, Brooklyn, NY (US);
Louis Markoya, Sandy Hook, CT (US);
Harry Sewell, Ridgefield, CT (US);
Aleksandr Khmelichek, Brooklyn, NY (US);
Louis Markoya, Sandy Hook, CT (US);
Harry Sewell, Ridgefield, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.