The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Dec. 23, 2003
Joost Jeroen Ottens, Veldhoven, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Jeroen Pieter Starreveld, Udenhout, NL;
Wouterus Johannes Petrus Maria Maas, Boxtel, NL;
Willem Jurrianus Venema, Eindhoven, NL;
Boris Menchtchikov, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Jeroen Pieter Starreveld, Udenhout, NL;
Wouterus Johannes Petrus Maria Maas, Boxtel, NL;
Willem Jurrianus Venema, Eindhoven, NL;
Boris Menchtchikov, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.