The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2007
Filed:
Mar. 30, 2004
Applicants:
Akitaka Makino, Hikari, JP;
Youji Takahashi, Kudamatsu, JP;
Minoru Soraoka, Shunan, JP;
Hideki Kihara, Kudamatsu, JP;
Susumu Tauchi, Shunan, JP;
Inventors:
Akitaka Makino, Hikari, JP;
Youji Takahashi, Kudamatsu, JP;
Minoru Soraoka, Shunan, JP;
Hideki Kihara, Kudamatsu, JP;
Susumu Tauchi, Shunan, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/00 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A vacuum processing apparatus includes a vacuum processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas. The vacuum processing chamber has an axisymmetric structure, including a double wall structure, and a gate valve for sealing an opening through which the object enters the processing chamber.