The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2007

Filed:

Nov. 15, 2004
Applicants:

Masahiro Watanabe, Yokohama, JP;

Takenori Hirose, Machida, JP;

Yukio Kembo, Tokyo, JP;

Yoshiyuki Nagano, Tsuchiura, JP;

Takafumi Morimoto, Kashiwa, JP;

Inventors:

Masahiro Watanabe, Yokohama, JP;

Takenori Hirose, Machida, JP;

Yukio Kembo, Tokyo, JP;

Yoshiyuki Nagano, Tsuchiura, JP;

Takafumi Morimoto, Kashiwa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method an apparatus for measuring the depths of many fine holes formed in the surface of a sample by etching. Positional information on a plurality of hole patterns is acquired by scanning, with a stylus, the surface of the sample in which the hole patterns are formed by etching. The depths of the plurality of hole patterns are measured by scanning, with the stylus, bottom faces of the plurality of hole patterns and the surface of the sample in the respective vicinities of the hole patterns on the basis of the positional information that has been acquired. Information on distribution of the depths of the plurality of hole patterns is displayed on a screen on the basis of information on the measured depths of the plurality of hole patterns and the positional information on each of the hole patterns.


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