The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Jan. 27, 2005
Jun Hatakeyama, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Izumi, JP;
Shinji Kishimura, Itami, JP;
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Kawagoe, JP;
Kazuhiro Yamanaka, Kawagoe, JP;
Jun Hatakeyama, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Masaru Sasago, Hirakata, JP;
Masayuki Endo, Izumi, JP;
Shinji Kishimura, Itami, JP;
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Kawagoe, JP;
Kazuhiro Yamanaka, Kawagoe, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Central Glass Co., Ltd., Ube, JP;
Abstract
A chemically amplified resist composition using an alternating copolymer of α-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.