The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Mar. 10, 2003
Hirofumi Arai, Tama, JP;
Hideaki Fukuda, Tama, JP;
Hirofumi Arai, Tama, JP;
Hideaki Fukuda, Tama, JP;
ASM Japan K.K., Tokyo, JP;
Abstract
A method of remote plasma cleaning a processing chamber of CVD equipment, which has high cleaning rates, low cleaning operational cost and high efficiency, is provided. The method comprises supplying cleaning gas to the remote plasma-discharge device; activating the cleaning gas inside the remote plasma-discharge device; and bringing the activated cleaning gas into the processing chamber and which is characterized in that a mixed gas of Fgas and an inert gas are used as the cleaning gas. A concentration of the Fgas is 10% or higher. The Fgas, which is a cleaning gas, is supplied to the remote plasma-discharge device from an Fgas cylinder by diluting Fgas at a given concentration by an inert gas.