The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2007

Filed:

Dec. 29, 2005
Applicants:

Yuko Iwabuchi, Mito, JP;

Hideo Todokoro, Nishitama-gun, JP;

Hiroyoshi Mori, Hitachinaka, JP;

Mitsugu Sato, Hitachinaka, JP;

Yasutsugu Usami, Toshina-ku, JP;

Mikio Ichihashi, Kodaria, JP;

Satoru Fukuhara, Hitachinaka, JP;

Hiroyuki Shinada, Chofu, JP;

Yutaka Kaneko, Hachiouji, JP;

Katsuya Sugiyama, Kashiwa, JP;

Atsuko Takafuji, Nerima-ku, JP;

Hiroshi Toyama, Hachiouji, JP;

Inventors:

Yuko Iwabuchi, Mito, JP;

Hideo Todokoro, Nishitama-gun, JP;

Hiroyoshi Mori, Hitachinaka, JP;

Mitsugu Sato, Hitachinaka, JP;

Yasutsugu Usami, Toshina-ku, JP;

Mikio Ichihashi, Kodaria, JP;

Satoru Fukuhara, Hitachinaka, JP;

Hiroyuki Shinada, Chofu, JP;

Yutaka Kaneko, Hachiouji, JP;

Katsuya Sugiyama, Kashiwa, JP;

Atsuko Takafuji, Nerima-ku, JP;

Hiroshi Toyama, Hachiouji, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.


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