The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2007

Filed:

Oct. 28, 2003
Applicants:

Joerg Bischoff, Illmenau, DE;

Shifang LI, Pleasanton, CA (US);

Xinhui Niu, Los Altos, CA (US);

Inventors:

Joerg Bischoff, Illmenau, DE;

Shifang Li, Pleasanton, CA (US);

Xinhui Niu, Los Altos, CA (US);

Assignee:

Timbre Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A structure formed on a semiconductor wafer is examined by directing an incident beam at the structure at an incidence angle and a azimuth angle. The incident beam is scanned over a range of azimuth angles to obtain an azimuthal scan. The cross polarization components of diffracted beams are measured during the azimuthal scan.


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