The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2007
Filed:
Jun. 14, 2004
Sanjay Gopinath, Fremont, CA (US);
Jeremie Dalton, San Jose, CA (US);
Jason M. Blackburn, Santa Clara, CA (US);
John Drewery, Alameda, CA (US);
Willibrordus Gerardus Maria Van Den Hoek, Saratoga, CA (US);
Sanjay Gopinath, Fremont, CA (US);
Jeremie Dalton, San Jose, CA (US);
Jason M. Blackburn, Santa Clara, CA (US);
John Drewery, Alameda, CA (US);
Willibrordus Gerardus Maria van den Hoek, Saratoga, CA (US);
Novellus Systems, Inc,, San Jose, CA (US);
Abstract
Methods for depositing a ruthenium metal layer on a dielectric substrate are provided. The methods involve, for instance, exposing the dielectric substrate to an amine-containing compound, followed by exposing the substrate to a ruthenium precursor and an optional co-reactant such that the amine-containing compound facilitates the nucleation on the dielectric surface.