The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Dec. 22, 2004
Norbert R. Bowering, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Timothy S. Dyer, Auburn, CA (US);
Hugh R. Grinolds, Fort Collins, CO (US);
Norbert R. Bowering, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Timothy S. Dyer, Auburn, CA (US);
Hugh R. Grinolds, Fort Collins, CO (US);
Cymer, Inc., San Diego, CA (US);
Abstract
Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.