The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Dec. 10, 2004
Jen-chieh Shih, Yongkang, TW;
Burn-jeng Lin, Hsin-Chu, TW;
Tsai-sheng Gau, Hsin-Chu, TW;
Ru-gun Liu, Hsin-Chu, TW;
Chun-kuang Chen, Taoyuang, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Horng-huei Tseng, Hsin-Chu, TW;
Jen-Chieh Shih, Yongkang, TW;
Burn-Jeng Lin, Hsin-Chu, TW;
Tsai-Sheng Gau, Hsin-Chu, TW;
Ru-Gun Liu, Hsin-Chu, TW;
Chun-Kuang Chen, Taoyuang, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Horng-Huei Tseng, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
An immersion optical projection system for photolithography is provided. A transparent plate is located between a last lens element and the wafer during a usage of the system. The transparent plate has a lens-side surface and a wafer-side surface. The system is adapted to have a layer of lens-side fluid located between the last lens element and the lens-side surface of the transparent plate, e.g., when the last lens element is operably located over the wafer during a photolithography process. The system is also adapted to have a layer of wafer-side fluid located between the wafer-side surface of the transparent plate and the wafer, during a usage of the system. The wafer-side fluid may or may not be fluidly connected to the lens-side fluid. The wafer-side fluid may or may not differ from the lens-side fluid.