The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Jul. 27, 2004
William N. Partlo, Poway, CA (US);
Norbert Bowering, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David W. Myers, Poway, CA (US);
Ian Roger Oliver, San Diego, CA (US);
John Viatella, San Diego, CA (US);
Robert N. Jacques, La Jolla, CA (US);
William N. Partlo, Poway, CA (US);
Norbert Bowering, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David W. Myers, Poway, CA (US);
Ian Roger Oliver, San Diego, CA (US);
John Viatella, San Diego, CA (US);
Robert N. Jacques, La Jolla, CA (US);
Cymer Inc., San Diego, CA (US);
Abstract
A laser produced plasma ('LPP') extreme ultraviolet ('EUV') light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.