The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
May. 28, 2004
Sven Antoin Johan Hol, Eindhoven, NL;
Johan Cornelis Compter, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Patricia Vreugdewater, Eindhoven, NL;
Sven Antoin Johan Hol, Eindhoven, NL;
Johan Cornelis Compter, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Patricia Vreugdewater, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.